Interfacial and mechanical characterization of wafer-bonded GaSb/amorphous α-(Ga,As)/GaAs structure for GaSb-on-insulator applications
In this study, the feasibility of using wafer-bonding technology to fabricate a GaSb semiconductor on GaAs substrate for potentially creating a GaSb-on-insulator structure has been demonstrated. A GaSb wafer has been bonded on two types of GaAs substrates:
(1) a regular single crystal semi-insulating GaAs substrate(2) the GaAs wafers with pre-deposited low-temperature amorphous α-(Ga,As) layers.
The microstructures and interface adhesion studies have been carried out on these wafer-bonded semiconductors. It has been found that the GaSb-on-α-(Ga,As) wafers have shown enhanced interface adhesion and lower temperature bonding capability.
(1) a regular single crystal semi-insulating GaAs substrate(2) the GaAs wafers with pre-deposited low-temperature amorphous α-(Ga,As) layers.
The microstructures and interface adhesion studies have been carried out on these wafer-bonded semiconductors. It has been found that the GaSb-on-α-(Ga,As) wafers have shown enhanced interface adhesion and lower temperature bonding capability.
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